Substrate with light shielding film and liquid crystal display



(57)【要約】 【課題】パターン欠け等の欠陥が発生しにくい遮光膜付 き基板を得る。 【解決手段】基板上に多層構造の遮光膜が形成されてな る遮光膜付き基板であって、遮光膜の基板から最も離れ た最上層は、40〜80原子%のクロム、10〜40原 子%の酸素及び10〜50原子%の窒素を含む層であ り、最上層に接する第2層は、70原子%以上100原 子%未満のクロムと最上層より濃度の低い窒素とを含む 層であるか、または70〜100原子%のクロムを含み 窒素を含まない層であることを特徴とする。
PROBLEM TO BE SOLVED: To provide a substrate with a light shielding film hardly causing defects such as pattern deflects. SOLUTION: In the substrate on which a light shielding film having a multilayered structure is formed, the uppermost layer of the light shielding film farthest from the substrate contains 40 to 80 atm.% chromium, 10 to 40 atm.% oxygen and 10 to 50 atm.% nitrogen, and the second layer adjacent to the uppermost layer contains 70 atm.% to <100 atm.% chromium and nitrogen with lower concentration than in the uppermost layer or contains 70 to 100 atm.% chromium and no nitrogen. COPYRIGHT: (C)2002,JPO




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